
Introduction:郑州科佳KJ150-XK是一款管式扩散氧化炉,适用于企业研发、大学及科研院所的科研与教学。可满足多晶硅、氮化硅、扩散、氧化、退火等工艺。
Temperature Range
1100°C/1400°C/1700°C
Door Opening Style
Side/ Top/ Bottom/ Bottom-lift/ Bogie
Process Applications
Sintering / Brazing / Heat Treatment
Heating Elements & Temp Zones
Resistance wire/ SiC/ MoSi₂
Single/ Multi-zones
Chamber Size
Standard / Custom
Custom Service Process
